Amorphous carbon thin film, manufacturing method thereof and optical system including the same
US11004659B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Aug 6, 2018 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Aug 1, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing an amorphous carbon thin film is provided. The method includes the following steps: providing a substrate in a reaction chamber; flowing a precursor and a carrier gas into the reaction chamber; and performing a PECVD method to deposit the amorphous carbon thin film on the substrate. Wherein, the precursor includes a compound having a C≡N functional group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.