Coating method, display substrate and manufacturing method thereof, and display device
US11005081B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2019 |
| Grant date | May 11, 2021 |
| Priority date | — |
| Expiry date | Jun 20, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/40
Abstract
Provided are a coating method, a display substrate and a manufacturing method thereof, and a display device. The coating method includes: forming a micro-fluid channel on a first surface of a first substrate, wherein the first surface is a surface to be coated of the first substrate, and a sidewall of the micro-fluid channel is the first surface of the first substrate; immersing one end of the micro-fluid channel into ink, to enable the ink to fill the micro-fluid channel; and drying the ink filling the micro-fluid channel to form a thin film on the first surface of the first substrate. The present disclosure can help implement uniform film formation of a quantum dot light-emitting layer at a high resolution, reduce the process difficulty of a high-resolution product and improve the device performance and the display performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.