Film thickness measuring method and film thickness measuring apparatus
US11009340B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2018 |
| Grant date | May 18, 2021 |
| Priority date | — |
| Expiry date | Nov 17, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8422
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A film thickness measuring apparatus includes a displacement sensor, and a film thickness calculator that includes a first processor, a second processor, and a third processor. The displacement sensor detects displacement of a sheet in its thickness direction at a location opposite to a portion of a terahertz scanner from which a terahertz wave is applied to a conveyance path. In accordance with a detection signal provided by the displacement sensor, the first processor determines the speed of displacement of the sheet in its thickness direction while the sheet is conveyed along the conveyance path. In accordance with the speed of displacement, the second processor corrects a scan waveform acquired by the terahertz scanner. In accordance with the peaks of the intensity of the terahertz wave that appear in the scan waveform corrected by the second processor, the third processor calculates the thickness of a film formed on the sheet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.