Anti-reflection film and deep ultraviolet light-emitting device
US11009629B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 22, 2017 |
| Grant date | May 18, 2021 |
| Priority date | — |
| Expiry date | Jan 30, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/857
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Provided is an anti-reflection film having low reflectance even for oblique incidence, which film is highly moisture resistant and is suitable for use in a deep ultraviolet light-emitting device. The anti-reflection film includes: a first layer having a first refractive index, provided on the window member; a second layer having a second refractive index; and a third layer having a third refractive index. For light having a wavelength of 280 nm, the first refractive index is 1.6 or more and 2.0 or less, the second refractive index is 2.0 or more and 2.7 or less and is higher than the first refractive index, the third refractive index is 1.3 or more and 1.6 or less and is lower than the first refractive index, and materials of the layers having the first refractive index, the second refractive index, and the third refractive index are made of oxides different from each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.