Method of calculating etching profile of acid-etched fracture system considering complex filtration media
US11015924B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 5, 2020 |
| Grant date | May 25, 2021 |
| Priority date | — |
| Expiry date | Nov 5, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V2210/646
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
The invention introduces a method of calculating etching profile of acid-etched fracture system considering complex filtration media, which mainly considers dynamic filtration caused by natural fractures and acid-etched wormholes in acid fracturing, calculates the above filtration process by a numerical method, and finally calculates acid etching profile of acid-etched fracture system based on acid concentration profile. Calculation equations include fluid pressure in natural fractures, filtration velocity in natural fractures, fracture geometry of hydraulic fractures, fluid pressure in matrix rock, acid concentration profile in natural fractures and hydraulic fractures, acid etching width in hydraulic fractures and natural fractures, and length of acid-etched wormhole, etc. The invention is reliable in principle and efficient in calculation, which is also beneficial to accurately calculating fracture etching profiles of acid fracturing in naturally-fractured reservoirs, improving the accuracy of optimizing acid fracturing treatment parameters, and providing guiding significance for acid fracturing optimization of naturally-fractured carbonate reservoirs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.