Patent · US Active

Dual cure monomers

US11021574B2 · kind B2 · utility

0Cited by
17References
17Claims
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Key dates

Filing dateNov 21, 2017
Grant dateJun 1, 2021
Priority date
Expiry dateNov 21, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08G59/22
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

Provided are dual cure monomer are of the formula: (I) wherein R* is a (hetero)hydrocarbyl group; X1 is —O—, —S—, —NR3—, —NR3—CO—NR3, —CO—NR3— or NR3—CO—, where R3 is H, C1-C4 alkyl or R1-Epoxy; R1 is a divalent (hetero)hydrocarbyl group; X2 is —O—, —S—, —NR4—, —NR4—CO—NR4—, —CO—NR4—, —NR4—CO— where R4 is H, C1-C4 alkyl or R2—CH═CH2; R2 is a divalent (hetero)hydrocarbyl group; subscripts a and b are at least one, subscripts c and d are at least one, with the proviso that the monomer has at least two epoxy groups and at least two ene groups.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.