Electrostatic chuck device having focus ring
US11024528B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 21, 2016 |
| Grant date | Jun 1, 2021 |
| Priority date | — |
| Expiry date | Oct 29, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6875
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.