Process for hydrogenating silicon tetrachloride
US11027979B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 2016 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Dec 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/1071
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention relates to a process for hydrogenating silicon tetrachloride in a reactor, wherein a reactant gas containing hydrogen and silicon tetrachloride is heated to a temperature between 850° C. and 1600° C. by means of at least one heating element, which comprises a graphite surface, wherein the temperature of the heating element is between 850° C. and 1600° C. The process is characterized in that a nitrogen compound is added to the reactant gas in a substance amount fraction of 0.1 to 10% based on hydrogen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.