Glass for semiconductor processing
US11028005B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Aug 28, 2020 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Aug 28, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2221/68386
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
To provide a glass plate having a high Young's modulus and a high devitrification viscosity. A glass includes, in mol % based on oxides: SiO2 of 30.0 to 50.0%; B2O3 of 10.0 to 30.0%; Al2O3 of 10.0 to 30.0%; Y2O3 of 3.0 to 17.0%; and Gd2O3 of 3.5 to 17.0%, in which (Gd2O3+Y2O3) is from 16.0 to 22.0%, and (Gd2O3/Y2O3) is from 0.15 to 7.0.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.