Antireflection film, optical element, optical system, method of producing antireflection film
US11029449B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2019 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Aug 9, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B15/173
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection film is formed by laminating an interlayer, a silver-containing metal layer containing silver, and a dielectric layer in this order from the substrate, an anchor region including an oxide of an anchor metal is provided between the silver-containing metal layer and the interlayer, a cap region including an oxide of the anchor metal included in the anchor region is provided between the silver-containing metal layer and the dielectric layer, a crystal grain size obtained by X-ray diffraction measurement in the silver-containing metal layer is less than 6.8 nm, and the anchor metal has a surface energy less than a surface energy of silver and greater than a surface energy of a layer of the interlayer closest to the silver-containing metal layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.