Pattern detection
US11030452B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2019 |
| Grant date | Jun 8, 2021 |
| Priority date | — |
| Expiry date | Mar 14, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20036
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for detecting a known pattern having homogeneous areas includes the steps of taking an image of the known pattern or, of at least a portion of the known pattern, and performing detection. Detection includes an initial detection of a first region of the image and the detection of a feature of the known pattern within a second region of the image. The second region is arranged adjacent to the first region. The initial detection is aimed at estimating at least one region parameter, such as a position of the region of the pattern, and/or orientation of the region or distortion of same. Starting from this, the second region can be selected in which a feature, such as a corner of the checkerboard is detectable. This second detection step is aimed at obtaining at least one region parameter such as the position of a feature within the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.