Linear substrate processing compartment
US11033923B2 · kind B2 · utility
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38References
17Claims
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Key dates
| Filing date | May 8, 2017 |
| Grant date | Jun 15, 2021 |
| Priority date | — |
| Expiry date | May 8, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S118/19
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.