Patent · US Active

Methods for multiple-patterning nanosphere lithography for fabrication of periodic three-dimensional hierarchical nanostructures

US11037794B2 · kind B2 · utility

0Cited by
5References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 25, 2019
Grant dateJun 15, 2021
Priority date
Expiry dateSep 25, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/30655
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A robust and general fabrication/manufacturing method is described herein for the fabrication of periodic three-dimensional (3D) hierarchical nanostructures in a highly scalable and tunable manner. This nanofabrication technique exploits the selected and repeated etching of spherical particles that serve as resist material and that can be shaped in parallel for each processing step. The method enables the fabrication of periodic, vertically aligned nanotubes at the wafer scale with nanometer-scale control in three dimensions including outer/inner diameters, heights/hole-depths, and pitches. The method was utilized to construct 3D periodic hierarchical hybrid silicon and hybrid nanostructures such as multi-level solid/hollow nanotowers where the height and diameter of each level of each structure can be configured precisely as well as 3D concentric plasmonic supported metal nanodisk/nanorings with tunable optical properties on a variety of substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.