Shadow mask for OLED evaporation and manufacturing method therefor, and OLED panel manufacturing method
US11038009B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2019 |
| Grant date | Jun 15, 2021 |
| Priority date | — |
| Expiry date | Oct 11, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/233
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A shadow mask used for OLED evaporation and a manufacturing method therefor, and an OLED panel manufacturing method. The shadow mask used for OLED evaporation includes: a semiconductor substrate including a front surface and a back surface opposite thereto, a recess penetrating the front surface and the back surface being provided in the semiconductor substrate; and a grid film layer provided on the front surface of the semiconductor substrate. A number of openings arranged in an array are provided in the grid film layer. Each of the openings has an upper portion and a lower portion. A width of the upper portion is greater than a width of the lower portion. The recess exposes the number of openings in the grid film layer and the grid film layer between adjacent openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.