Patent · US Active

Dispenser shield with adjustable aperture to improve drop placement and residual layer thickness

US11040366B2 · kind B2 · utility

0Cited by

7References

17Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Logan L. Simpson · Coupland, US
Seth J. Bamesberger · Austin, US
John Williamson · Glasgow, GB

Key dates

Filing date	Sep 18, 2018
Grant date	Jun 22, 2021
Priority date	—
Expiry date	Mar 2, 2039

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB05C5/025
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.