Patent · US Active

Nano-imprinting method and nano-imprinting device

US11042086B2 · kind B2 · utility

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5Claims
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Assignee

Inventors

Key dates

Filing dateMay 13, 2019
Grant dateJun 22, 2021
Priority date
Expiry dateSep 28, 2039

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0002
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An embodiment of this disclosure provides a nano-imprinting method, including: applying an imprinting adhesive on a to-be-processed layer of a substrate located in an imprinting chamber; charging the imprinting chamber with a preset gas at a temperature higher than a boiling point of the preset gas, and pressing a nano-imprinting template on the imprinting adhesive; reducing an ambient temperature of the imprinting chamber to a temperature lower than the boiling point of the preset gas and maintaining the temperature for a preset time, such that the preset gas becomes a liquid; irradiating ultraviolet light from a side of the nano-imprinting template away from the imprinting adhesive to cure the imprinting adhesive; raising the ambient temperature of the imprinting chamber to be higher than the boiling point of the preset gas, such that the liquefied preset gas turns back into a gas; and demolding the nano-imprinting template from the imprinting adhesive.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.