Quantum dot film having porous structure and manufacturing method for the same
US11043647B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Dec 7, 2018 |
| Grant date | Jun 22, 2021 |
| Priority date | — |
| Expiry date | Dec 7, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/774
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.