Patent · US Active

Residue-minimized antiperspirant composition with improved skin feel

US11045399B2 · kind B2 · utility

0Cited by

4References

16Claims

0Family size

Assignee

Henkel AG & Co. KGaA · DE

Inventors

Thomas Doering · Dormagen, DE
Daniel Solich · Langenfeld, DE

Key dates

Filing date	Dec 18, 2018
Grant date	Jun 29, 2021
Priority date	—
Expiry date	Jan 8, 2040

Classification

Technology area (CPC A)Human Necessities
CPC primaryA61K2800/87
WIPO fieldPharmaceuticals
WIPO sectorChemistry

Abstract

The present disclosure relates to substantially anhydrous sweat-suppressing compositions which leave minimal residues on textiles and at the same time result in an improved skin feel after application, containing combinations of rice starch and cornstarch or maize amylopectin, volatile and non-volatile oils, and at least one sweat-suppressing active agent.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.