Method for removing boron
US11052348B2 · kind B2 · utility
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4References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 26, 2017 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Jul 31, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2257/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for removing boron is provided, which includes (a) mixing a carbon source material and a silicon source material in a chamber to form a solid state mixture, (b) heating the solid state mixture to a temperature of 1000° C. to 1600° C., and adjusting the pressure of the chamber to 1 torr to 100 torr. The method also includes (c) conducting a gas mixture of a first carrier gas and water vapor into the chamber to remove boron from the solid state mixture, and (d) conducting a second carrier gas into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.