Fine metal mask, display substrate, and alignment method therefor
US11053579B2 · kind B2 · utility
1Cited by
0References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2017 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Nov 5, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/549
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A fine metal mask (100) comprising a pattern region (110) comprising a plurality of openings; and a plurality of alignment holes (120) located outside the pattern region (110). Also disclosed are a display substrate (200) and an alignment method for the fine metal mask (100) for evaporation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.