Sintered non-porous cathode and sputter ion vacuum pump containing the same
US11056326B2 · kind B2 · utility
1Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2017 |
| Grant date | Jul 6, 2021 |
| Priority date | — |
| Expiry date | Feb 25, 2038 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2300/611
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.