Self-cleaning film system and method of forming same
US11059035B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2020 |
| Grant date | Jul 13, 2021 |
| Priority date | — |
| Expiry date | Feb 5, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y30/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A self-cleaning film system configured for reducing a visibility of a contaminant includes a substrate and a film. The film includes a monolayer defining a plurality of cavities and formed from a first material having a first surface energy, and a plurality of patches disposed within the plurality of cavities. Each of the patches is formed from a photocatalytic material having a second surface energy that is higher than the first. The film has a touchpoint area having a first use frequency, and a second area having a second use frequency that is less than the first. The patches are present in the touchpoint area in a first concentration and are configured to direct the contaminant towards the second area. The patches are present in the second area in a second concentration that is higher than the first and are configured to reduce the visibility of the contaminant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.