Patent · US Active

Apparatus, system and method for providing a vacuum ejector for an end effector

US11059187B2 · kind B2 · utility

0Cited by
16References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 27, 2019
Grant dateJul 13, 2021
Priority date
Expiry dateNov 27, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6838
  • WIPO fieldHandling
  • WIPO sectorMechanical engineering

Abstract

An apparatus, system and method for providing a vacuum ejector for use with an end effector. Included may be at least an end effector and a vacuum chamber for gripping an element during semiconductor processing. The end effector may include at least two clamp arms for placing a gripped element in relation to application of a vacuum to the gripped element; a vacuum cup having a mouth capable of sealing to the gripped element to provide a vacuum chamber; a vacuum ejector pin extending into the vacuum chamber and including a plurality of ports substantially at a tip thereof proximate to the gripped element, wherein the vacuum is applied by the plurality of ports; and an ejector pin actuator that is capable of moving the vacuum ejector pin toward the gripped element until the sealing of the mouth is broken and the gripped element is ejected from the vacuum cup.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.