Patent · US Active

Protective layer for photopolymer

US11059930B2 · kind B2 · utility

1Cited by

9References

17Claims

0Family size

Assignee

Covestro Deutschland AG · DE

Inventors

Serguei Kostromine · Rheinbach, DE
Thomas Roelle · Leverkusen, DE
Wieland Hovestadt · Leichlingen, DE
Karl Vetterle · Leverkusen, DE
Therese KLOBUTOWSKI · Leverkusen, DE

Key dates

Filing date	Jul 23, 2018
Grant date	Jul 13, 2021
Priority date	—
Expiry date	Jul 23, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG03H2260/12
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a protective layer comprising a photopolymer layer B and an at least partly cured protective layer C, to a process for producing the layer construction according to the invention, to a kit of parts, to the use of an at least partly cured protective layer C for protection of a photopolymer layer B and to optical displays and security documents comprising the layer construction according to the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.