Method of production of uniform metal plates and sputtering targets made thereby
US11062889B2 · kind B2 · utility
0Cited by
19References
11Claims
0Family size
Assignee
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Key dates
| Filing date | May 30, 2018 |
| Grant date | Jul 13, 2021 |
| Priority date | — |
| Expiry date | Nov 18, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2998/10
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of making a metal or metal alloy target having the steps of providing a billet, the billet having a generally cylindrical configuration and having a central axis, cutting the billet in half parallel to the central axis to form at least a half cylindrical blank, and cross rolling the half cylindrical blank to form a target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.