Patent · US Active

Method of manufacturing a multilayer optical element

US11067727B2 · kind B2 · utility

0Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 28, 2019
Grant dateJul 20, 2021
Priority date
Expiry dateFeb 28, 2039

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29D11/0073
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for manufacturing a multilayer optical element is disclosed. In an embodiment the method includes providing a substrate, applying a first optical layer by applying a first layer having a dielectric first material having a first refractive index, structuring the first layer by sectionally removing the first material and filling first interspaces with a dielectric second material having a second refractive index different from the first refractive index so that the second material has at least the same height as the first material, and applying at least a second optical layer by applying a second layer having the first material, structuring the second layer by sectionally removing the first material so that the first optical layer is exposed in second interspaces between second areas with the first material and filling the second interspaces with the second material so that the second material has at least the same height as the first material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.