Patent · US Active

Compositions and processes for self-assembly of block copolymers

US11067893B2 · kind B2 · utility

0Cited by
43References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 19, 2017
Grant dateJul 20, 2021
Priority date
Expiry dateAug 5, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0274
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present invention relates to a novel styrenic polymer and to the novel composition comprised of this polymer and a solvent; wherein the styrenic polymer has a polydispersity from 1 to 1.3 and further wherein each polymer chain of the styrenic polymer is capped with one end group of structure 1), wherein, and L is a linking group selected from the group consisting of a direct valence bond, oxy (—O—), carbonyloxy, (—(C═O)—O—), carbonate (—O—(C═O)—O—); L2 is a C-1 to C-20 substituted or unsubstituted alkylene spacer, an arylene spacer or a direct valence bond, R, is hydrogen, a halide, a C-1 to C-20 alkyl moiety, or a C-1 to C-20 alkyloxy moiety, m is an integer from 1 to 3; and (I) represent the direct valence bond attaching the end group 1) to the end of the polymer chain of the styrenic polymer. In another aspect of this invention it pertains to the use of this composition to create self-assembly process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.