Patent · US Active

Method of producing an optoelectronic semiconductor component, and optoelectronic semiconductor component

US11069663B2 · kind B2 · utility

0Cited by
0References
18Claims
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Key dates

Filing dateJan 12, 2018
Grant dateJul 20, 2021
Priority date
Expiry dateApr 14, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/0364
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of producing an optoelectronic semiconductor component includes A) providing at least three source substrates, wherein each of the source substrates is equipped with a specific type of radiation-emitting semiconductor chips, B) providing a target substrate having a mounting plane configured to mount the semiconductor chips thereto, C) forming platforms on the target substrate, and D) transferring at least some of the semiconductor chips with a wafer-to-wafer process from the source substrates onto the target substrate so that the semiconductor chips transferred to the target substrate maintain their relative position with respect to one another, within the types of semiconductor chips, wherein on the target substrate the semiconductor chips of each type of semiconductor chips have a specific height above the mounting plane due to the platforms so that the semiconductor chips of different types of semiconductor chips have different heights.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.