Patent · US Active

Method for producing a technical mask

US11072041B2 · kind B2 · utility

0Cited by

0References

21Claims

0Family size

Assignee

LPKF LASER & ELECTRONICS AG · DE

Inventors

Roman Ostholt · Langenhagen, DE
Norbert Ambrosius · Kevelaer, DE
Arne Schnoor · Hannover, DE
Daniel Dunker · Hannover, DE
Kevin M. Hale · Woodstock, US
Moritz Doerge · Bad Nenndorf, DE
Stephan Wenke · Neustadt, DE

Key dates

Filing date	Mar 5, 2018
Grant date	Jul 27, 2021
Priority date	—
Expiry date	Mar 5, 2038

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB23K2103/54
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method for producing a technical mask includes: providing a technical mask including at least one plate-shaped substrate, the plate-shaped substrate being transparent to at least one laser wavelength; and producing at least one opening in the mask by laser-induced deep etching. In an embodiment, an etching attack takes place at least temporarily on one side during laser-induced deep etching.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.