System and method for stimulated emission depletion projection stereolithography

US11072160B2 · kind B2 · utility

Assignees

• Lawrence Livermore National Security, LLC · US
• The Regents of the University of California · US

Inventors

• Ryan Hensleigh · Colstrip, US
• Bryan D. Moran · Pleasanton, US
• Julie A. Jackson · Xenia, US
• Eric B. Duoss · Danville, US
• Brett Kelly · Berkeley, US
• Maxim Shusteff · Oakland, US
• Hayden Taylor · Oakland, US
• Christopher M. Spadaccini · Oakland, US

Key dates

• Filing date: Aug 23, 2016
• Grant date: Jul 27, 2021
• Expiry date: Mar 9, 2037

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B33Y30/00
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

The present disclosure relates to a system for forming a three dimensional (3D) part. The system may incorporate a beam delivery subsystem for generating optical signals, and a mask subsystem that receives the optical signals and generates optical images therefrom. A first one of the optical images activates a polymerization species of a photo-sensitive resin in accordance with illuminated areas thereof, to thus cause polymerization of select portions of the photo-sensitive resin to help form a layer of the 3D part. A second one of the optical images causes stimulated emission depletion of subportions of the polymerization species, simultaneously, over various areas of the layer, to enhance resolution of at least one subportion of the select portions of the photo-sensitive resin.