Process for coating a conductive component and conductive component coating
US11072850B2 · kind B2 · utility
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2References
3Claims
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Key dates
| Filing date | Jul 19, 2017 |
| Grant date | Jul 27, 2021 |
| Priority date | — |
| Expiry date | Oct 22, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention describes a process for coating conductive component in a plasma reactor and a conductive component coating, wherein the process includes the steps of cleaning, mechanical support deposition, topographic modification by plasma bombardment, chemical support layer deposition and amorphous carbon layer deposition (Diamond-Like Carbon). In one embodiment, the process is in single cycle. The present invention pertains to the fields of Materials Engineering, Physics and Chemistry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.