Patent · US Active

Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures

US11072867B2 · kind B2 · utility

0Cited by

14References

20Claims

0Family size

Assignee

CITY UNIVERSITY OF HONG KONG · CN

Inventors

Christopher M. Lee · Kowloon, CN
Yang Li · Santa Clara, US
Jian Lu · Kowloon, CN

Key dates

Filing date	Oct 3, 2017
Grant date	Jul 27, 2021
Priority date	—
Expiry date	Jun 24, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC25D11/26
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Described herein are systems and methods for performing a surface mechanical attrition treatment (SMAT) to the surface of a variety of materials including thin films, nanomaterials, and other delicate and brittle materials. In an aspect, a surface of a material is modified to a modified surface and from an original state to a modified state, wherein the modified state comprises a physical modification, a chemical modification, or a biological modification. In another aspect, a surface mechanical attrition treatment (SMAT) is applied to the modified surface of the material for a defined duration of time, wherein a condition associated with the SMAT is adjusted based on a structural composition of the material. In yet another aspect, a defined strain is imposed on the structural composition of the material based on the SMAT.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.