Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof
US11079676B2 · kind B2 · utility
3Cited by
2References
23Claims
0Family size
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Key dates
| Filing date | Jun 24, 2019 |
| Grant date | Aug 3, 2021 |
| Priority date | — |
| Expiry date | Oct 14, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation-sensitive composition is to be used in exposure with an extreme ultraviolet ray or an electron beam, and includes a first polymer and a solvent, wherein the first polymer includes a first structural unit including: at least one metal atom; and at least one carbon atom that each bonds to the metal atom by a chemical bond and does not constitute an unsaturated bond, and at least one chemical bond is a covalent bond. Every chemical bond is preferably a covalent bond. The metal atom is preferably tin, germanium, lead or a combination thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.