Detection apparatus, exposure apparatus, and article manufacturing method
US11079692B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 29, 2020 |
| Grant date | Aug 3, 2021 |
| Priority date | — |
| Expiry date | Jun 29, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7026
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A detection apparatus for detecting a plurality of marks arranged on a substrate is provided. The apparatus includes a stage which supports the substrate, a plurality of detectors arranged apart from each other and configured to detect different marks of the plurality of marks arranged on the substrate, and a processor. For each of predetermined combinations of the detectors, the processor inclines a reference member supported by the stage at an inclination according to information on a position of a detection region and a focal position of each detector, and aligns a reference mark arranged on the reference member with each detector, and the processor obtains a measurement offset value of each of the plurality of detectors based on measurement values each acquired by the alignment performed for each of the plurality of predetermined combinations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.