Correction techniques of overlapping digital glyphs
US11080464B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2019 |
| Grant date | Aug 3, 2021 |
| Priority date | — |
| Expiry date | Jul 18, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V30/414
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Digital glyph overlap correction system implemented as part of a computing device is described. The system is configured to improve detection and correction of overlaps of digital glyphs by detecting on overlap of digital glyphs within a digital document, determining a glyph property causing the overlap, determining a change to the parameter of the glyph property that causes the overlap, generating a correction for the overlap based on the change to the parameter, and rendering the digital document as having the correction. The digital glyph overlap correction system corrects or facilitates correction of the overlap in an efficient and seamless manner, thereby improving the aesthetic appeal of content within the digital document.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.