Method for etching the surface of aluminum fragments, aluminum fragments with an etched surface and material composites containing such fragments
US11085117B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2017 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Apr 26, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K2003/0812
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A method for etching fragments of aluminum or an aluminum alloy comprising the steps of: a. providing a hydrochloric acid solution in a trough-shaped container; b. inoculating the hydrochloric acid solution by chemically dissolving an amount of aluminum to produce an etching solution; c. adding the fragments to the etching solution immediately after the inoculation; d. etching the fragments for 0.5 to 10 minutes while stirring in such a way that the fragments are entrained by the motion of the etching solution; e. stopping the etching by diluting the etching solution with water; f. removing the etched fragments; g. repeatedly rinsing the fragments with water and h. rinsing the fragments with an organic desiccant. An etched fragment of aluminum or an aluminum alloy and also to a composite material comprising etched fragments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.