Lithium niobate devices fabricated using deep ultraviolet radiation
US11086048B1 · kind B1 · utility
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21Claims
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Key dates
| Filing date | Feb 7, 2020 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Feb 7, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical device is described. At least a portion of the optical device includes lithium niobate and is fabricated utilizing ultraviolet lithography. In some aspects the at least the portion of the optical device is fabricated using deep ultraviolet lithography. In some aspects, the short range root mean square surface roughness of a sidewall of the at least the portion of the optical device is less than ten nanometers. In some aspects, the at least the portion of the optical device has a loss of not more than 2 dB/cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.