Fabrication system of semiconductor device and method of fabricating a semiconductor device using the same
US11086224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2019 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Nov 7, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2686
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are a system for fabricating a semiconductor device and a method of fabricating a semiconductor device. The system may include a chamber, an extreme ultraviolet (EUV) source in the chamber and configured to generate an EUV beam, an optical system on the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a particle collector between the reticle and the optical system and configured to allow for a selective transmission of the EUV beam and to remove a particle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.