Selective application of plasma treatment
US11087191B2 · kind B2 · utility
0Cited by
2References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 7, 2018 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Mar 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06K15/1836
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method may include with a raster image processor, creating pretreatment plane rasterized image data from source image data and, with a plasma emitter, selectively applying a plasma treatment to a surface of a print media based on the pre-treatment plane rasterized image data. A printing device may include a raster image processor to execute an image analysis module to create pre-treatment plane rasterized image data from source image data and a plasma emitting device to selectively apply a plasma treatment to a surface of a print media based on the pre-treatment plane rasterized image data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.