Patent · US Active

Multi-beam charged particle system

US11087948B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss MultiSEM GmbH · DE

Inventors

Dirk Zeidler · Oberkochen, DE
Thomas Kemen · Meppen, DE
Christof Riedesel · Oberkochen, DE
Ralf Lenke · Lauchheim, DE
Joerg Jacobi · Herbrechtingen, DE

Key dates

Filing date	Jul 28, 2020
Grant date	Aug 10, 2021
Priority date	—
Expiry date	Jul 28, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.