Method for depositing a functional material on a substrate
US11089690B2 · kind B2 · utility
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1References
8Claims
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Assignee
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Key dates
| Filing date | Mar 16, 2016 |
| Grant date | Aug 10, 2021 |
| Priority date | — |
| Expiry date | Apr 6, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for depositing a functional material on a substrate is disclosed. An optically transparent plate having a first surface and a second surface with one or more wells is provided. After coating the second surface with a thin layer of light-absorbing material, the wells are filled with a functional material. The plate is then irradiated with a pulsed light to heat the layer of light-absorbing material in order to generate gas at an interface between the layer of light-absorbing material and the functional material to release the functional material from the wells onto a receiving substrate located adjacent to the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.