Complex vapor chamber structure
US11092385B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2019 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | May 23, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L23/3672
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A complex vapor chamber structure includes a main body and at least one tubular body. The main body has a first chamber, a first opening and a second opening. A first capillary structure is disposed in the first chamber. A working fluid is filled in the first chamber. The first and second openings pass through one face of the main body to communicate with the first chamber. The tubular body has a first end, a second end and a passage. The first and second ends are respectively correspondingly inserted in the first and second openings, whereby the passage of the tubular body communicates with the first chamber via the first and second ends to form a loop for vapor-liquid circulation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.