Metrology and profilometry using light field generator
US11092427B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2018 |
| Grant date | Aug 17, 2021 |
| Priority date | — |
| Expiry date | Jan 11, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/335
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for metrology and profilometry using a light field generator are disclosed. For this purpose, a system such as an optical analysis system scans a sample using light, and detects light reflected off a sample in various ways. The system operates different operational modes including a backscatter intensity, a triangulation, and an interferometric mode. For this purpose, the optical analysis system includes one or more optical angle modulation systems, such as surface acoustic wave (SAW) modulators, that emit light, a sample holder, and a scanning system that scans the one or more SAW modulators relative to the sample holder. The system performs tomographic reconstructions of information generated by the scans to create 3D maps/volume datasets of the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.