Resist composition, method of forming resist pattern, polymeric compound, and copolymer
US11099479B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 4, 2017 |
| Grant date | Aug 24, 2021 |
| Priority date | — |
| Expiry date | May 26, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2059
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 represents an integer of 0 to 2; Ra00 represents an acid dissociable group represented by general formula (a0-r1-1); Ra01 and Ra02 represents a hydrocarbon group; Ra01 and Ra02 may be mutually bonded to form a ring; Ya0 represents a quaternary carbon atom; Ra031, Ra032 and Ra033 each independently represents a hydrocarbon group, provided that at least one of Ra031, Ra032 and Ra033 is a hydrocarbon group having a polar group).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.