Patent · US Active

Substrate processing system

US11101157B2 · kind B2 · utility

2Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 29, 2018
Grant dateAug 24, 2021
Priority date
Expiry dateApr 16, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68707
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate processing system includes a substrate processing set and a substrate holding unit. The substrate processing set includes a substrate supporting part for supporting a vertical substrate. The substrate holding unit includes two cantilevers and two substrate holding parts. Each of the substrate holding parts is respectively located on each of the cantilevers. The two substrate holding parts are used for holding the substrate vertically. When the substrate holding unit moves next to the substrate processing set and the two substrate holding parts touch the substrate, the two substrate holding parts hold the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.