Patent · US Active

Efficient wide bandgap GaN-based LED chip based on surface plasmon effect and manufacturing method therefor

US11101406B2 · kind B2 · utility

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9Claims
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Key dates

Filing dateDec 25, 2016
Grant dateAug 24, 2021
Priority date
Expiry dateFeb 7, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/819
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An efficient wide bandgap GaN-based LED chip based on a surface plasmon effect and a manufacturing method therefor. The efficient wide bandgap GaN-based LED chip is of a flip-chip structure, and comprises, from bottom to top in sequence, a substrate, a buffer layer, an unintentionally doped GaN layer, an n-GaN layer, a quantum well layer, an electron blocking layer, a p-GaN layer, a metallic reflecting mirror layer, a passivation layer, a p-electrode layer, an n-electrode layer; and a position of a bottom surface of the metallic reflecting mirror layer connected to a surface of the p-GaN layer is provided with a micro-nano composite metal structure. A micro metal structure comprises alternating protrusion portions and recess portions; and a nano metal structure is distributed on an interface of the micro metal structure and the p-GaN layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.