Stereolithography apparatus with individually addressable light source arrays
US11104061B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | May 13, 2019 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | May 13, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C64/124
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A bottom-up stereolithography apparatus includes a frame; a light-transmissive window the window having a top surface portion; a drive assembly connected to the frame (and in some embodiments positioned above the light-transmissive window); a micro-LED or a vertical cavity surface emitting laser (VCSEL) source array to the frame and positioned below the light-transmissive window; and a controller operatively associated with the drive assembly and the source array, the controller configured for producing an object on the elevator assembly from a polymerizable resin on the window by bottom-up stereolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.