Liquid jetting device, liquid jetting head cleaning device, and liquid jetting head cleaning method
US11104141B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2020 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | Apr 22, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2002/16573
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Provided are a liquid jetting device, a liquid jetting head cleaning device, and a liquid jetting head cleaning method, in which an increase in the number of jetting failures is suppressed in a case where a nozzle surface of a liquid jetting head is cleaned by causing a napped wiping member to abut against the nozzle surface.The problem is solved by a liquid jetting head cleaning device, in which first cleaning is performed on a liquid jetting head by causing a napped wiping member to abut against a nozzle surface of the liquid jetting head, second cleaning is performed on the liquid jetting head by causing a liquid to be first pre-jetted from a nozzle of the liquid jetting head after the first cleaning and causing an unnapped wiping member to abut against the nozzle surface of the liquid jetting head after the first pre-jetting, the liquid is pre-jetted from the nozzle of the liquid jetting head after the second cleaning, and the number of times of jetting in the first pre-jetting is larger than the number of times of jetting in the second pre-jetting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.