Evaporation mask and evaporation method
US11104984B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Jun 27, 2017 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | Oct 27, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K50/171
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An evaporation mask and an evaporation method are disclosed. The evaporation mask includes a blocking region and a plurality of evaporation regions arranged in an array. Each of the plurality of evaporation regions is integrally formed as an opened structure; the blocking region is disposed to surround each of the evaporation regions to separate adjacent evaporation regions; and the blocking region is provided with a plurality of perforated structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.