Ultra-fine pattern deposition apparatus, ultra-fine pattern deposition method using the same, and light-emitting display device manufactured by ultra-fine pattern deposition method
US11104985B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 29, 2018 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | Oct 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition apparatus, such as an ultra-fine pattern deposition apparatus is provided. A deposition apparatus includes a base substrate, a heating assembly, a deposition source material and a pattern guide. The heating assembly has at least a part thereof included in the base substrate. The deposition source material is disposed on the heating assembly. The pattern guide overlies the base substrate and has a portion thereof above the heating assembly and the deposition source material. The pattern guide has an opening including a laterally recessed lower region and an upper region. The opening extends from an upper surface of the base substrate to an upper surface of the pattern guide. The lower region of the opening is wider than the upper region of the opening, and the opening of the pattern guide is configured to guide a material emitted from the deposition source material to a target region on a target substrate that is spaced apart from the base substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.